Engineer's Office for Applied Spectroscopy


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Film Thickness Measurement
Method Principles
  Schematic Gauge Setup
  Example: Lacquer  Coatings
  Example: Vapor Deposition
  Example: Webcoater

Plasma Emission Measurement
Schematic Gauge Setup





Film Thickness Measurement

These pages (please select on the left side) explain our film thickness measurement technology using the white-light interference phenomenon. Our TranSpec Lite and TranSpec film thickness gauges distinguish from all others because of:

Non-contact and non-destructive measurement

Non-radiation optical method using white light, no calibration required!

Fast measurement and evaluation - within milliseconds!

Wide thickness range, up to ~ 0.1 to 150 Ám ( 0.004 to 6 mil )

High accuracy - typically better ▒ 0.005 Ám over the entire thickness range

Simultaneous determination of double-layers possible

Motion bridge controlled measurement on webcoaters possible

Application Note Film Thickness Measurement 

Plasma Emission Measurement

An objectively and continuously process control of low-pressure plasma deposition techniques, such as PVD (Physical Vapor Deposition), is one of the real issues today. Aside from a visual examination of the plasma's light emission, sometimes the mass spectroscopy technique is used. Specially the mass spectroscopy is neither handy to operate nor the results are easy to interpret. Compared with this, the benefits of using the OES (Optical Emission Spectroscopy) and our fiber optics coupled TranSpec Spectrometers are obvious:

Simultaneous measurement in the spectral range 200...1000 nm

Detection of even very low emission intensities

Connectable to every vacuum chamber using a special flange

Maintenance-free technology - no wavelength re-calibration required!

Comfortable and easy-to-use software PEM-ProVis Professional

Application Note Plasma Emission Measurement